Résultats des tests de spécification
For Microelectronic Use |
|
Assay (H₂O₂) |
30.0 - 32.0 % |
Color (APHA) |
≤ 6 |
Free Acid (µeq/g) |
≤ 0.6 |
Residue after Evaporation |
≤ 5 ppm |
Chloride (Cl) |
≤ 0.06 ppm |
Nitrate (NO₃) |
≤ 0.4 ppm |
Phosphate (PO₄) |
≤ 0.20 ppm |
Sulfate (SO₄) |
≤ 0.2 ppm |
Trace Impurities - Aluminum (Al) |
≤ 10.0 ppb |
Arsenic and Antimony (as As) |
≤ 5.0 ppb |
Trace Impurities - Barium (Ba) |
≤ 10.0 ppb |
Trace Impurities - Beryllium (Be) |
≤ 10.0 ppb |
Trace Impurities - Bismuth (Bi) |
≤ 10.0 ppb |
Trace Impurities - Boron (B) |
≤ 10.0 ppb |
Trace Impurities - Cadmium (Cd) |
≤ 10.0 ppb |
Trace Impurities - Calcium (Ca) |
≤ 10.0 ppb |
Trace Impurities - Chromium (Cr) |
≤ 10.0 ppb |
Trace Impurities - Cobalt (Co) |
≤ 10.0 ppb |
Trace Impurities - Copper (Cu) |
≤ 10.0 ppb |
Trace Impurities - Gallium (Ga) |
≤ 10.0 ppb |
Trace Impurities - Germanium (Ge) |
≤ 10.0 ppb |
Trace Impurities - Gold (Au) |
≤ 10.0 ppb |
Trace Impurities - Iron (Fe) |
≤ 10.0 ppb |
Trace Impurities - Lead (Pb) |
≤ 10.0 ppb |
Trace Impurities - Lithium (Li) |
≤ 10.0 ppb |
Trace Impurities - Magnesium (Mg) |
≤ 10.0 ppb |
Trace Impurities - Manganese (Mn) |
≤ 10.0 ppb |
Trace Impurities - Molybdenum (Mo) |
≤ 10.0 ppb |
Trace Impurities - Nickel (Ni) |
≤ 10.0 ppb |
Trace Impurities - Niobium (Nb) |
≤ 10.0 ppb |
Trace Impurities - Potassium (K) |
≤ 10.0 ppb |
Trace Impurities - Silicon (Si) |
≤ 10.0 ppb |
Trace Impurities - Silver (Ag) |
≤ 10.0 ppb |
Trace Impurities - Sodium (Na) |
≤ 10.0 ppb |
Trace Impurities - Strontium (Sr) |
≤ 10.0 ppb |
Trace Impurities - Tantalum (Ta) |
≤ 10.0 ppb |
Trace Impurities - Thallium (Tl) |
≤ 10.0 ppb |
Trace Impurities - Tin (Sn) |
≤ 10.0 ppb |
Trace Impurities - Titanium (Ti) |
≤ 10.0 ppb |
Trace Impurities - Vanadium (V) |
≤ 10.0 ppb |
Trace Impurities - Zinc (Zn) |
≤ 10.0 ppb |
Trace Impurities - Zirconium (Zr) |
≤ 10.0 ppb |
Particle Count - 0.2 µm and greater |
≤ 1175 par/ml |
Particle Count at point of fill - 0.5 µm and greater |
≤ 150 par/ml |